Coating Materials Product Center
Advanced Targets Materials Co., Ltd is one of the leading manufacturers of sputtering targets, arcing cathodes and evaporation materials for the PVD thin film companies worldwide. We offer advanced sputtering targets with purities ranging from 99.9% to 99
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Chromium Sputtering Targets
Premium Chromium Sputtering Targets for corrosion-resistant PVD coatings. 99.5%-99.95% purity, HIP/HP technology, customizable solutions. Ideal for automotive, photovoltaic, and decorative industries. Trusted quality with ISO-certified production.
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TiAl Targets
Our titanium-aluminum(TiAl) targets are used for decorative coatings on electronic devices. In addition, thanks to the resistance to oxidation and toughness, our titanium-aluminum targets are also widely used as the coatings of milling machines, drills and other tools.
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CrAl Sputtering Target
Thanks to the toughness, high thermal stability and resistance to oxidation, our chromium-aluminum (CrAl) targets are widely used as the coatings of milling machines, drills and other tools.
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Titanium-Silicon Sputtering Targets
If we combine titanium and silicon together, they are becoming wear resistant even when the temperatures are high. This is because the former ensures remarkably tough coatings and the latter guarantees high resistance to oxidation.
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Titanium Sputtering Targets
Purity: 99.5%, 99.9%, 99.99% Shapes: Circular (disc), rectangular (planar), tubular (rotatable) Sizes: Customizable — standard diameters from 1" to 12" Bonding: Available with indium or elastomer bonding on backing plates (Cu, Mo, or others)
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Zirconium Sputtering Targets
Zirconium sputtering targets are essential materials for the thin film deposition industry and are primarily used in the Physical Vapor Deposition (PVD) process.
