TiAl Targets

Our titanium-aluminum(TiAl) targets are used for decorative coatings on electronic devices. In addition, thanks to the resistance to oxidation and toughness, our titanium-aluminum targets are also widely used as the coatings of milling machines, drills and other tools. The titanium-aluminum coatings enhance the metal removal rates, feed speeds and cutting performance and extend the service life.

Tial Sputtering Target

Advanced Targets is a TiAl sputtering targets manufacturer supplying titanium-aluminum alloy targets for TiAlN and AlTiN hard coatings. Our targets are used by PVD coating companies, cutting-tool manufacturers and coating R&D teams that require controlled alloy composition, homogeneous microstructure and repeatable batch performance.

We manufacture TiAl targets from high-quality titanium and aluminum materials through powder preparation, HIP, sintering, precision machining and surface finishing. Standard Ti/Al compositions and custom aluminum contents from 10 to 90 at.% are available for R&D trials, replacement targets and production coating lines.

TiAl Targets

Custom TiAl Sputtering Targets

As a custom TiAl sputtering targets manufacturer, Advanced Targets can adjust the product according to your coating process and equipment.

Available customization includes:

  • Ti/Al composition from 10 to 90 at.% aluminum;

  • Standard or customer-specified impurity control;

  • R&D samples and production batches;

  • Round, rectangular and drawing-based geometry;

  • Diameter, length, thickness and edge details;

  • Mounting holes, grooves and threads;

  • Planar target or arc cathode configuration;

  • Backing-plate and bonding requirements;

  • Grain size and microstructure requirements;

  • Surface roughness and finishing method;

  • Laser marking and batch identification;

  • Agreed inspection and material documentation.


Surface Treatment and Machining for TiAl Sputtering Targets

ProcessPurpose
Precision MachiningAchieve customized dimensions and tolerance requirements
Surface GrindingProvide smooth target surface for stable sputtering
PolishingReduce surface defects and improve deposition consistency
Ultrasonic CleaningRemove machining residues and contaminants
Dimensional InspectionEnsure accurate fit with sputtering equipment
Bonding TreatmentProvide bonded targets according to cathode requirements



TiAl Targets

Tial Sputtering Target Manufacturing Process

  • Material Selection: We carefully select high-quality Titanium and Aluminum to ensure the highest purity for our targets.

  • Alloying: The Titanium and Aluminum are alloyed to achieve a homogeneous TiAl material with the desired properties.

  • Machining: The alloy is precision-machined into the required target shapes and sizes.

  • Sintering and Annealing: The targets undergo sintering and annealing to enhance their density and structural integrity.

  • Surface Polishing: Each target is polished to ensure a smooth surface, optimizing sputtering performance and minimizing impurities.

  • Quality Control: Every target is inspected for quality and consistency, including checks for purity, mechanical strength, and uniformity.


TiAl Sputtering Target Options

ItemAvailable Specification
MaterialTitanium-aluminum alloy
Product namesTiAl sputtering target, titanium aluminum sputtering target, TiAl target
Minimum purity≥99.5%
Standard product purity99.7% for listed common compositions
Standard compositionsTi25Al75, Ti30Al70, Ti33Al67, Ti40Al60, Ti50Al50 and Ti75Al25
Custom compositionAluminum content from 10 to 90 at.%
Manufacturing routePowder metallurgy, HIP, sintering, annealing and precision machining
ShapesRound/disc, rectangular/plate and custom geometry
Target configurationPlanar target, arc cathode and drawing-based custom target
Rotatable targetEvaluated according to composition, dimensions and equipment drawing
SizeCustomized for R&D and production applications
SurfaceMachined, ground or polished according to the agreed requirement
Backing and bondingAvailable after target and backing-plate compatibility review
InspectionComposition, impurity, microstructure, density, dimensions and surface condition
Quality managementISO 9001 qualified since 2015
MOQNo MOQ for common products; R&D samples are available
Typical lead timeAbout 15 days for regular sizes or samples; about 30 days for batch orders


Standard TiAl Compositions

Ti/Al Ratio (at.%)PurityGuaranteed DensityTypical Selection Direction
25/7599.7%3.11 g/cm³High-aluminum TiAlN or AlTiN coating development
30/7099.7%3.20 g/cm³High-temperature and dry-machining coating trials
33/6799.7%3.26 g/cm³High-Al hard coatings for drills, cutters and inserts
40/6099.7%3.38 g/cm³Balance of hardness, oxidation resistance and process stability
50/5099.7%3.56 g/cm³General-purpose TiAlN coatings for tools, dies and wear parts
75/2599.7%4.00 g/cm³Ti-rich coating development where toughness and adhesion are priorities


Advantages of Tial Sputtering Target

  • High Purity: Our TiAl targets are guaranteed to have a minimum purity of 99.5%, ensuring that you achieve clean and high-quality films with minimal contamination.

  • Customizable Composition: The TiAl alloy can be customized to different Titanium-to-Aluminum ratios, giving you the flexibility to tailor the target to your specific application needs.

  • Superior Film Quality: The targets produce films with excellent adhesion, smooth surfaces, and low stress, which are essential for high-performance thin film coatings.

  • Long-lasting Durability: TiAl sputtering targets are designed to withstand high-energy bombardment during the sputtering process, ensuring durable performance with minimal degradation over time.


Applications of Tial Sputtering Target

  • Semiconductors: For thin film deposition used in electronics and microelectronics manufacturing.

  • Optical Coatings: Ideal for creating durable coatings for optical lenses, mirrors, and filters.

  • Wear-Resistant Coatings: Used in the production of high-performance wear-resistant coatings for industrial tools, machine parts, and automotive components.

  • Aerospace and Automotive: TiAl coatings are applied for high-temperature applications where durability and heat resistance are critical.

  • Energy: The targets are also employed in the production of solar cells and other renewable energy technologies, ensuring efficient thin film deposition for photovoltaic applications.


How to Select the Right TiAl Target

Selection FactorRecommended OptionSuitable For
General TiAlN coatingTi50Al50Cutting tools, dies and general wear-resistant coatings
Higher Al contentTi40Al60, Ti33Al67 or Ti30Al70High-temperature cutting and oxidation-resistant coating development
Ti-rich compositionTi75Al25Applications prioritizing coating toughness and adhesion
Standard industrial purity≥99.5%General industrial and decorative PVD coatings
Higher batch consistency99.7%Production tool coatings requiring controlled impurities
R&D or proprietary coatingCustom Al content from 10–90 at.%Coating trials and composition optimization
Equipment compatibilityCustom dimensions and mounting detailsExisting magnetron, arc cathode or target holder


TiAl Targets for TiAlN and AlTiN Coatings

TiAl sputtering targets are used in reactive PVD processes with nitrogen to deposit TiAlN or AlTiN coatings. These coatings are selected for their combination of hardness, wear resistance and oxidation resistance.

Typical coated products include:

  • Carbide drills and end mills;

  • Milling cutters and hobbing cutters;

  • Indexable cutting inserts;

  • Punches and stamping dies;

  • Injection molds and forming tools;

  • Industrial blades and cutting components;

  • Bearings, shafts, gears and other wear parts;

  • Electronic-device hardware and decorative metal components.


Inspection and Batch Consistency

Advanced Targets maintains an integrated production and machining line for binary and multi-component alloy targets. Depending on the agreed specification, inspection methods can include:

  • ICP analysis for metallic impurities;

  • LECO analysis for gas elements;

  • SEM examination of microstructure;

  • Optical microscopy;

  • C-scan ultrasonic testing;

  • Density measurement;

  • Dimensional and surface inspection.


ISO 9001:2015&Patent Certificate

ISO 9001:2015&Patent Certificate

If you use our titanium-aluminum targets, our HIP technology will ensure that remarkably fewer droplets are formed on your product during coating. So our targets keep your coatings smoother. Tial Sputtering Target

Titanium aluminum targets are widely used in the coating of milling cutter, drill bit, hobbing cutter and stamping die in machining. Excellent high temperature oxidation resistance can prolong the service life of tools and dies. According to the special requirements of customers, we developed cral alloy target with ultra-fine grain structure, which can effectively reduce the production of liquid droplets in the coating process and provide the coating rate.


Frequently Asked Questions

  • What purity can you supply?
    The guaranteed minimum purity is 99.5%. The listed standard TiAl compositions are available at 99.7% purity.

  • Can the Ti/Al ratio be customized?
    Yes. Aluminum content can be customized from 10 to 90 at.% according to your coating requirements.

  • Which composition is suitable for general TiAlN coatings?
    Ti50Al50 is a practical starting point for cutting tools, dies and general wear-resistant coatings.

  • Can you manufacture according to our drawing?
    Yes. Dimensions, shape, mounting holes, grooves, surface finish and target configuration can be customized.

  • Do you have an MOQ?
    There is no MOQ for common products. Samples are available for R&D and coating trials.

  • What is the normal lead time?
    Regular sizes and samples normally require about 15 days. Batch orders normally require around 30 days.

  • Can you provide inspection documents?
    Composition, impurity, density, dimensional and microstructure inspection can be arranged according to the agreed specification.

  • What information is required for a quote?
    Please provide the Ti/Al ratio, purity, dimensions, drawing, target configuration, equipment model, quantity and delivery requirement.


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