TiAl Sputtering Target
Our titanium-aluminum(TiAl) targets are used for decorative coatings on electronic devices. In addition, thanks to the resistance to oxidation and toughness, our titanium-aluminum targets are also widely used as the coatings of milling machines, drills and other tools. The titanium-aluminum coatings enhance the metal removal rates, feed speeds and cutting performance and extend the service life.
Tial Sputtering Target
The TiAl Sputtering Target from Advanced Targets is a high-performance material designed for precision thin film deposition. Made from a Titanium-Aluminum alloy, these targets are engineered to meet the demands of various industries requiring high-quality, durable coatings. Our TiAl sputtering targets are customizable and are known for their excellent uniformity, purity, and reliable performance across different sputtering applications.
Purity guaranteed at a minimum of 99.5%
TiAl targets with customized compositions are available (Aluminum content: 10at% to 90at%)
Sizes suitable for R&D applications are also available
High Purity: Our TiAl targets are guaranteed to have a minimum purity of 99.5%, ensuring that you achieve clean and high-quality films with minimal contamination.
Customizable Composition: The TiAl alloy can be customized to different Titanium-to-Aluminum ratios, giving you the flexibility to tailor the target to your specific application needs.
Superior Film Quality: The targets produce films with excellent adhesion, smooth surfaces, and low stress, which are essential for high-performance thin film coatings.
Long-lasting Durability: TiAl sputtering targets are designed to withstand high-energy bombardment during the sputtering process, ensuring durable performance with minimal degradation over time.
Semiconductors: For thin film deposition used in electronics and microelectronics manufacturing.
Optical Coatings: Ideal for creating durable coatings for optical lenses, mirrors, and filters.
Wear-Resistant Coatings: Used in the production of high-performance wear-resistant coatings for industrial tools, machine parts, and automotive components.
Aerospace and Automotive: TiAl coatings are applied for high-temperature applications where durability and heat resistance are critical.
Energy: The targets are also employed in the production of solar cells and other renewable energy technologies, ensuring efficient thin film deposition for photovoltaic applications.
Material Selection: We carefully select high-quality Titanium and Aluminum to ensure the highest purity for our targets.
Alloying: The Titanium and Aluminum are alloyed to achieve a homogeneous TiAl material with the desired properties.
Machining: The alloy is precision-machined into the required target shapes and sizes.
Sintering and Annealing: The targets undergo sintering and annealing to enhance their density and structural integrity.
Surface Polishing: Each target is polished to ensure a smooth surface, optimizing sputtering performance and minimizing impurities.
Quality Control: Every target is inspected for quality and consistency, including checks for purity, mechanical strength, and uniformity.
At Advanced Targets, we adhere to the highest manufacturing standards to produce TiAl sputtering targets that meet the exacting requirements of our clients. Our products are made in an ISO 9001:2015 certified facility, ensuring strict quality control throughout the production process. We offer both small and large batch manufacturing capabilities, with a focus on delivering consistent and reliable results. All TiAl targets are rigorously tested for purity, mechanical strength, and film quality before shipment.
| Main TiAl targets | ||||||
| Titanium/aluminum content [at%] | 25/75 | 30/70 | 33/67 | 40/60 | 50/50 | 75/25 |
| Purity [%] | 99.7 | 99.7 | 99.7 | 99.7 | 99.7 | 99.7 |
| Guaranteed density [g/cm3] | 3.11 | 3.20 | 3.26 | 3.38 | 3.56 | 4.00 |
We supply titanium-aluminum targets with guaranteed purity because we produce our titanium-aluminum products from the titanium-aluminum powder to the finished product ourselves. And our targets have homogenous microstructure.
If you use our titanium-aluminum targets, our HIP technology will ensure that remarkably fewer droplets are formed on your product during coating. So our targets keep your coatings smoother.
Titanium aluminum targets are widely used in the coating of milling cutter, drill bit, hobbing cutter and stamping die in machining. Excellent high temperature oxidation resistance can prolong the service life of tools and dies. According to the special requirements of customers, we developed cral alloy target with ultra-fine grain structure, which can effectively reduce the production of liquid droplets in the coating process and provide the coating rate.
RELATED PRODUCTS
Nickel-Chromium Sputtering Targets
Thanks to the supper heat insulation effect and excellent light transmittance, our nickel-chromium(NiCr) targets are widely used in large area glass coatings to make Low-E glass.
Production and purification of aluminum Aluminum is obtained by extracting alumina from bauxite and then electrolysis in molten cryolite.
Tantalum(Ta) is one of the rare, hard, blue gray, and highly corrosion-resistant refractory metals. The melting point of tantalum is 2980 ℃, and the density is 16.68g/cm³.
Molybdenum Alloy Sputtering Targets
Because molybdenum(Mo) alloy has higher recrystallization temperature, better creep resistance, higher ductility, higher weldability and better resistance to oxidation than the pure molybdenum, molybdenum-based alloy targets are more widely used in high-temperature applications
Other products with different proportion of ingredients can be customized
