Chromium Sputtering Targets
TiAl Sputtering Target
CrAl Sputtering Target
Titanium Silicon Sputtering Targets
Titanium Sputtering Targets
Zirconium Sputtering Targets
Tungsten Sputtering Targets
Chromium Silicon Sputtering Target
TiAlSi Sputtering Targets
CrAlSi Sputtering Targets
Molybdenum Alloy Sputtering Targets
Tantalum Sputtering Targets
Niobium Sputtering Targets
Graphite Target
Silicon Sputtering Target
Aluminum Target
WC Sputtering Targets
NiV Sputtering Targets
NiCr Sputtering Targets
ITO Sputtering Targets
AZO Sputtering Targets
Evaparation Materials
Evaporation Source
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Jun. 20, 2024
PVD, PECVD and DLC Coatings
PVD – acronym for Physical Vapor Deposition – is an environmental friendly high vacuum coating technology for thin film deposition on different kinds of base materials in plasma atmosphere.