magnetron coating sputtering target

What It Is: Magnetron coating sputtering targets are materials used in magnetron sputtering systems to deposit thin films. These targets are made from various metals and alloys depending on the coating requirements.
Applications: Commonly used in electronics, optics, and photovoltaics for coating substrates with high-quality, uniform films.
Advantages: High deposition efficiency
Excellent uniformity and consistency of coatings
Suitable for large-area coatings
How to Choose: Choose based on the specific film properties required, such as thickness and uniformity, and the target’s material compatibility with your sputtering system.
Chromium Sputtering Targets
Chromium Sputtering Targets

Premium Chromium Sputtering Targets for corrosion-resistant PVD coatings. 99.5%-99.95% purity, HIP/HP technology, customizable solutions. Ideal for automotive, photovoltaic, and decorative industries. Trusted quality with ISO-certified production.

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magnetron coating sputtering target

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Technical Expertise:Rich R&D and manufacturing experience in sputtering targets and arcing cathodes.
Innovation:Collaborates with top research institutes like the Chinese Academy of Sciences.
Quality & Consistency:Uses advanced powder metallurgy processes and imported German equipment for stable, high-quality products.
Customer Focus:Provides cost-effective solutions and rapid response to help clients with R&D and problem-solving.
Reputation:Supplies leading global PVD service suppliers, recognized for consistent quality.
Environmental Commitment:No pollution emissions during production, compliant with international standards.
Certifications:Recognized as a "High-Tech Enterprise" by Hebei Province.

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