Global Sputtering Target Provider

As a global sputtering target provider, we supply high-quality materials for thin film deposition applications in industries such as semiconductor manufacturing, solar energy, and optics. Our targets are made from a variety of metals, alloys, and ceramics, each engineered to meet the specific demands of your application. Whether you are based in North America, Europe, Asia, or elsewhere, our global distribution network ensures that businesses worldwide receive premium sputtering targets with reliable delivery and competitive pricing.

CrAl Sputtering Target

Thanks to the toughness, high thermal stability and resistance to oxidation, our chromium-aluminum (CrAl) targets are widely used as the coatings of milling machines, drills and other tools.

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Chromium Aluminum Silicon Targets

ADVANCED TARGETS offers CrSiAl (Chromium Silicon Aluminum) sputtering targets, specially designed for high-performance thin film deposition. These targets combine the hardness of chromium, the thermal stability of silicon, and the oxidation resistance of aluminum.

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Chromium Silicon Sputtering Target

Advanced Targets use high-purity raw materials combined with advanced manufacturing techniques to produce top-quality sputtering targets. Our team supplies premium targets in a variety of shapes and sizes for all OEM platforms.

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Chromium Sputtering Targets

Premium Chromium Sputtering Targets for corrosion-resistant PVD coatings. 99.5%-99.95% purity, HIP/HP technology, customizable solutions. Ideal for automotive, photovoltaic, and decorative industries. Trusted quality with ISO-certified production.

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Titanium Aluminum Silicon

Other products with different proportion of ingredients can be customized

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Titanium-Silicon Sputtering Targets

If we combine titanium and silicon together, they are becoming wear resistant even when the temperatures are high. This is because the former ensures remarkably tough coatings and the latter guarantees high resistance to oxidation.

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Zirconium Sputtering Targets

Zirconium sputtering targets are essential materials for the thin film deposition industry and are primarily used in the Physical Vapor Deposition (PVD) process.

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Titanium Sputtering Targets

Purity: 99.5%, 99.9%, 99.99% Shapes: Circular (disc), rectangular (planar), tubular (rotatable) Sizes: Customizable — standard diameters from 1" to 12" Bonding: Available with indium or elastomer bonding on backing plates (Cu, Mo, or others)

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Tungsten Sputtering Targets

Tungsten(W) has excellent strength and hardness, and can maintain these properties even at extremely high temperatures, which is very rare in metals.

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TiAl Targets

Our titanium-aluminum(TiAl) targets are used for decorative coatings on electronic devices. In addition, thanks to the resistance to oxidation and toughness, our titanium-aluminum targets are also widely used as the coatings of milling machines, drills and other tools.

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Global Sputtering Target Provider

Why Customers Choose Advanced Targets
High-purity sputtering targets and High-density sputtering targets: Our metal sputtering targets are produced with the highest material purity, ensuring reliable and consistent results in every coating application.
Tailored Solutions: We offer Custom sputtering targets for sale to meet the specific needs of various industries, from automotive coatings to luxury finishes.
Efficient Production and On-Time Delivery: We ensure fast turnaround times and on-time delivery to help you meet your production deadlines without compromising on quality.
Sustainability Focus: Our eco-friendly production methods help reduce environmental impact while maintaining the high performance of our sputtering targets.