cral thin film coating sputtering target

What It Is: CrAl thin film coating sputtering targets are designed to deposit high-performance thin films that offer excellent wear resistance and hardness. These targets are suitable for industrial and high-tech applications.
Applications: Used in tool coatings, electronics, and industrial components that require tough, durable coatings.
Advantages: Provides hard, durable coatings
Ideal for thin film applications requiring abrasion resistance
Extends the lifespan of tools and components
How to Choose: Choose based on the thin film coating requirements, including hardness, wear resistance, and film thickness.

CrAl Sputtering Target

Thanks to the toughness, high thermal stability and resistance to oxidation, our chromium-aluminum (CrAl) targets are widely used as the coatings of milling machines, drills and other tools.

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cral thin film coating sputtering target

Why Choose Us

Technical Expertise:Rich R&D and manufacturing experience in sputtering targets and arcing cathodes.
Innovation:Collaborates with top research institutes like the Chinese Academy of Sciences.
Quality & Consistency:Uses advanced powder metallurgy processes and imported German equipment for stable, high-quality products.
Customer Focus:Provides cost-effective solutions and rapid response to help clients with R&D and problem-solving.
Reputation:Supplies leading global PVD service suppliers, recognized for consistent quality.
Environmental Commitment:No pollution emissions during production, compliant with international standards.
Certifications:Recognized as a "High-Tech Enterprise" by Hebei Province.