What It Is: 200mm sputter targets are designed for sputtering processes using substrates that are 200mm in diameter. These targets are ideal for larger-scale production in semiconductor and coating industries.
Applications: Used in semiconductor manufacturing, solar cell production, and large-area coatings for industries requiring consistent and uniform thin-film deposition on substrates up to 200mm in diameter.
Advantages: Suitable for high-volume production
Provides uniform and precise coating on 200mm substrates
Ideal for industrial-scale sputtering systems
How to Choose: Choose based on the size of your substrates (200mm) and the specific coating requirements. Ensure the target material aligns with the required coating properties for your application.