Chromium Silicon Sputtering Target
Advanced Targets use high-purity raw materials combined with advanced manufacturing techniques to produce top-quality sputtering targets. Our team supplies premium targets in a variety of shapes and sizes for all OEM platforms.
DESCRIPTION
Purity: Available in 99.9% and 99.95%, manufactured using the HIP (Hot Isostatic Pressing) method.
Customization: Fully customizable to meet your application needs.
Shapes & Sizes:
Round discs and plates
Step targets (e.g., 300 mm diameter × 1 mm thick)
Rectangular sheets and step designs (e.g., 500 mm × 200 mm × 1 mm)
Tubular shapes (up to 300 mm in diameter, over 2 mm thick)
Advanced Targets use high-purity raw materials combined with advanced manufacturing techniques to produce top-quality sputtering targets. Our team supplies premium targets in a variety of shapes and sizes for all OEM platforms.
Advanced Targets provide Coordinate Measuring Machine (CMM) services to help customers map the exact profile of their sputtering targets. With precise CMM profiling, we can reverse-engineer enhanced target designs—allowing for increased material utilization and reduced target changeovers. This leads to significant cost savings for our customers.
(1) CrNiAlSi targets is widely used in Metco coating service,
Coating code name: APA CrN-mod. Excellent anti-stick unique solution for plastic and rubber applications
(2) CrAlSiW targets is widely used in balzers coating service,
Coating code name: ALDURA
(3) CrAlB targets is widely used in balzers coating service,
Coating code name: ATENSA
(4) And others like AtTiCr,CrSi,CrNiAlSi and so on
RELATED PRODUCTS
According to the chemical components, the ceramic targets can be divided into: Oxide-ceramic targets, Silicide-ceramic targets, Nitride-ceramic targets, Fluoride-ceramic targets and Sulfide-ceramic targets.
Niobium(Nb) is a silver gray, rare, soft, and ductile transition metal. The purity of niobium targets can reach over 99.95%, with small grain size, good recrystallization structure, and good triaxial consistency.
Molybdenum Alloy Sputtering Targets
Because molybdenum(Mo) alloy has higher recrystallization temperature, better creep resistance, higher ductility, higher weldability and better resistance to oxidation than the pure molybdenum, molybdenum-based alloy targets are more widely used in high-temperature applications
Titanium-Silicon Sputtering Targets
If we combine titanium and silicon together, they are becoming wear resistant even when the temperatures are high. This is because the former ensures remarkably tough coatings and the latter guarantees high resistance to oxidation.
Thanks to the toughness, high thermal stability and resistance to oxidation, our chromium-aluminum (CrAl) targets are widely used as the coatings of milling machines, drills and other tools.
Premium Chromium Sputtering Targets for corrosion-resistant PVD coatings. 99.5%-99.95% purity, HIP/HP technology, customizable solutions. Ideal for automotive, photovoltaic, and decorative industries. Trusted quality with ISO-certified production.
